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Equipment Introduction:
The polysilicon reduction furnace is a key equipment for producing polysilicon. It chemically reacts silicon raw materials with hydrogen under high temperature and high pressure conditions to produce polysilicon blocks. Polysilicon is an important semiconductor material and is widely used in solar cells, integrated circuits, optoelectronic devices and other fields.
Basic Parameters and Structural Features of the Equipment:
The equipment is mainly composed of shell components, bottom components, skirt components, starting electrode components, silicon core electrode components, etc.
Main material: The material structure of polysilicon reduction furnace is plate-forging structure, main material: 00Cr17Ni14Mo2.
The equipment structure design and material selection can be optimized according to the specific needs of users.
Application Range:
Polysilicon production.Polysilicon is an important semiconductor material, widely used in solar cells, integrated circuits, optoelectronic devices and other fields.
Technical Parameters:
parameter | Design pressure/MPa | Work Pressure/MPa | Operating temperature/℃ | Working medium | Insulation material thickness/ | Main Materials | weight/ | pressure class |
Inside the container | 0.3 | 0.2 | 300 | H₂ 、Si HCl₃ | 00Cr17Ni14Mo2 | |||
Shell | 0.6 | 0.53 | 130 | Cooling water | 100 | 9550 | Ⅱ |